# Plasmapro 100 Cobra

- **Source:** TED · `773729-2024`
- **Buyer:** Københavns Universitet
- **Published:** 2024-12-18
- **Deadline:** —
- **Estimated value:** 446,196 EUR
- **CPV codes:** 38000000
- **NUTS codes:** DK011, DNK
- **Notice type:** veat / 25

## Description

We are purchasing an ICP dry etching machine for the KU cleanroom, to be installed with fluorine-based chemistry within the cleanroom. It will be optimized for the etching silicon nitride structures on both silicon and GaAs substrates during installation. • Compatibility with current cleanroom equipment - Oxford Instruments Plasmalab 100 ICP65 • Be able to process 100mm wafers, as well as individual pieces to specification. • Must realize smooth sidewall structures in Silicon Nitride that are defined by Electron Beam Lithography (EBL). • Optimization for silicon nitride etching, though capable of etching other materials (such as NbTiN.

## Award result

- **Total awarded:** 446,196 EUR
- **Winner:** Oxford Instruments GmbH (CVR DE113869215) · value 446,196 EUR

## Original notice

https://ted.europa.eu/da/notice/-/detail/773729-2024