# III-V ICP Etcher

- **Source:** TED · `455705-2025`
- **Buyer:** Danmarks Tekniske Universitet - DTU
- **Published:** 2025-07-14
- **Deadline:** 2025-09-15
- **Estimated value:** —
- **CPV codes:** 38000000, 51430000
- **Place-of-performance NUTS:** DK012, DNK
- **Buyer-address NUTS:** —
- **Notice type:** cn-standard / 16

## Procedure details

Source lists may span several lots; list positions do not establish relationships.

### Procedure Types

- open

### Award Criterion Names

- Price
- Hardware, functionality and services
- Quality of submitted samples and performance evaluation

### Award Criterion Descriptions

- The price to be evaluated is the total price for the machines as well as the options, but not voluntary option, specified in Appendix 2 – Prices.
- DTU Nanolab will assess if the tender fulfils the specified evaluation requirements to sub-criterion “Quality of submitted samples”, and sub-criteria “Functionality and performance” is based on the Tenderer’s specifications in Appendix 1 – Requirement Specification.
- The performance evaluation is based on the returned samples: The provided samples shall show evidence of the Tenderers tool's capability of covering the processing requirements based on the process descriptions in the Appendix 3. DTU Nanolab will assess whether the submitted samples fulfil the specified evaluation requirements as defined in Appendix 3. Based on the assessment of fulfilments, points are awarded on the above-mentioned scale of 0-10. If the Tenderer has already submitted such demo samples, the Tenderer can refer to such submitted Demo samples instead of providing new samples.

### Submission Urls

- https://eu.eu-supply.com/app/rfq/rwlentrance_s.asp?PID=434628&B=

## Description

DTU requires a ICP reactive ion etcher to etch III-V materials with a special focus on etching GaAs micropillar devices from a planar microcavity (“the Instrument”). The system is expected to be delivered as soon as possible but at the latest in Q3 2026. The Instrument is to be the core instrument for a research project on optical devices. Besides that, it will be part of the shared open access instruments at the facility supporting research in micro and nano fabrication within optical devices and quantum computer developments. Therefore, DTU need a state-of-the-art instrument that can meet all current and future needs for etching III-V materials like GaAs, AlGaAs, InGaAs, AlInGaAsP and InP .

## Original notice

https://ted.europa.eu/da/notice/-/detail/455705-2025