# Magnetron Sputtering Devices

- **Source:** TED · `558177-2025`
- **Buyer:** Danmarks Tekniske Universitet - DTU
- **Published:** 2025-08-27
- **Deadline:** 2025-09-29
- **Estimated value:** 3,000,000 DKK
- **CPV codes:** 38400000, 38000000, 38430000, 38431000, 38432000, 38433000, 38434000
- **Place-of-performance NUTS:** DK012, DNK
- **Buyer-address NUTS:** —
- **Notice type:** cn-standard / 16

## Procedure details

Source lists may span several lots; list positions do not establish relationships.

### Procedure Types

- open

### Award Criterion Names

- Price

### Award Criterion Descriptions

- The most economically advantageous tender will be chosen amongst the acceptable tenders received. The most economically advantageous tender will be found by assessing the tender against Price. The price to be assessed is the prices in Appendix 2 – Prices. DTU will add the Total Agreement Value in section 2.1 with the Total price for Options in section 2.2.

### Options

- The tender contains the following options, which must be offered by the supplier, and which DTU may choose to use: - Magnetron Source - RF Power Source - LTS Setup Connection - LTS Loading Mechanism Please also see the options in the tender documents: Appendix 1 - Requirements Specification and Appendix 2 - Prices.

### Submission Urls

- https://eu.eu-supply.com/app/rfq/rwlentrance_s.asp?PID=438705&B=

## Description

DTU would like to purchase a magnetron sputtering devices for producing thing films of various materials, but primarily metals or metal alloys. The setup will be used by academic researchers investigating catalysts. The Sputtering system must be able to: • Achieve ultra-high vacuum base pressures. • Sputter clean substrates • Sputter deposit onto samples up to 4” in diameter • Ability to take in SHOM flag style sample holders and accompanying samples, and sputter deposit onto these samples • Have the potential to connect with an Ultra-High Vacuum (UHV) Linear Transfer System (LTS) allowing SHOM flag style sample holders and accompanying samples to be moved between the LTS and sputter deposition chamber. The system should be able to allow for samples produced in the sputter deposition chamber to be transferred to the LTS allowing these samples then to be moved to other equipment attached to the LTS where they can be tested or characterized all without being exposed to air.

## Original notice

https://ted.europa.eu/da/notice/-/detail/558177-2025