# Delivery and installation of a High ion density etcher for lithium niobate on insulator - LiNb03 (LN)

- **Source:** TED · `628101-2026`
- **Buyer:** Danmarks Tekniske Universitet - DTU
- **Published:** 2026-09-11
- **Deadline:** 2026-10-15
- **Estimated value:** —
- **CPV codes:** 42000000, 38636110, 38810000
- **Place-of-performance NUTS:** DK013, DNK
- **Buyer-address NUTS:** DK013
- **Notice type:** cn-standard / 16

## Procedure details

Source lists may span several lots; list positions do not establish relationships.

### Procedure Types

- open

### Award Criterion Names

- Price
- Quality, Functionality and Performance

### Award Criterion Descriptions

- Based on the offered prices
- Based on the tenderers answers to Appendix 1

### Selection Criterion Descriptions

- The Tenderer must show that it has the technical and professional ability to fulfil the contract. The Ten-derer must demonstrate this by providing at least 3 relevant references for comparable agreements, showing that the Tenderer has previously delivered, installed and serviced a High ion density plasma etcher for etching of lithium niobate on insulator, substantially equivalent to the Instrument. The agreement, to which the reference refers, must not be more than 5 years old. The date is calculated from the last delivery date of the machine under the agreement in the reference.

### Question Deadlines

- 2026-10-08Z

### Documents Urls

- https://eu.eu-supply.com/app/rfq/rwlentrance_s.asp?PID=459768&TID=200420236&B=

### Submission Urls

- https://eu.eu-supply.com/app/rfq/rwlentrance_s.asp?PID=459768&TID=200420236&B=

## Description

DTU Nanolab wishes to acquire a high ion density source reactive ion etcher for etching lithium niobate on insulator 150 mm wafer processing. Delivery is expected no later than Q4 2027. We are looking for a highly versatile instrument providing stable etch recipes, capable of etching at both nanometer scale and micrometer scale with precise control of etching depth, typically a few hundreds of nm. The instrument must have state-of-the-art performance in terms of profile control, uniformity, selectivity, and in particu-lar etching sidewall smoothness to achieve low waveguide loss. The Instrument will be installed in the DTU Nanolab cleanroom - a university facility providing a comprehensive suite of micro- and nanofabrication tools. It serves a diverse community of over 200 active users, ranging from novice students to experienced researchers, as well a high percentage of commercial clients. At DTU Nanolab there are several research groups and companies working on developing and running small scale production of optical devises on the tools. Therefor the capability of etching smooth optical waveguide, gratings and other low-roughness optical devises are of high importance to us.

## Original notice

https://ted.europa.eu/da/notice/-/detail/628101-2026