tender for a batch spray tool

DTU Nanolab requires one spray tool equipped with ozone, HF, HCl and NH4OH for wafer cleaning purposes. The tool is to be able to handle batch processing (up to 25 wafers per run). The tool will be used in our ISO 14644-1 Class 4 and 5 clean room. The tool will be used by many different users with diverse backgrounds, which means that operator safety is an important aspect. Another important aspect is the ease of use with special attention on software operation and setup change for different wafer sizes. Please see Appendix 1 Requirement specification for further information.